| 摘要 |
<p>A method for fabricating an OPC(optical proximity correction) mask is provided to improve a focus margin by using a defocus model in a region where a focus margin is decreased by the characteristic of exposure equipment or by a previous process. A plurality of chips(120) are disposed on a mask(110), selectively using a defocus model having a normal model in an optimum focus condition(focus deviation=0) and a focus deviation of a predetermined dimension. Among the plurality of chips, a chip using the normal model can be disposed in a center column and a chip using the defocus model can be disposed in a corner column.</p> |
