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发明名称
Verfahren zum Herstellen thermisch stabilen Silizids
摘要
申请公布号
DE19904065(B4)
申请公布日期
2008.01.31
申请号
DE19991004065
申请日期
1999.02.02
申请人
NATIONAL SEMICONDUCTOR CORP.(N.D.GES.D.STAATES DELAWARE)
发明人
ESSAIAN, STEPAN;NAEM, ABDALLA
分类号
H01L21/26;H01L21/28;H01L21/285;H01L21/324;H01L21/336
主分类号
H01L21/26
代理机构
代理人
主权项
地址
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