| 摘要 |
PROBLEM TO BE SOLVED: To provide a target holder for magnetron sputtering having simple structure, with which the utilization efficiency of a target can be enhanced by uniformizing erosion of the target. SOLUTION: The target holder 10 has a plurality of permanent magnets 3 arranged on a back face side of a held target 1 and forms the magnetic field on an outer surface of the target 1 to promote evaporation of the target. The permanent magnets 3 are arranged in a deviating manner from a center of an outer surface of the target 1. When the target 1 is evaporated and worn due to the sputtering, the target or the permanent magnets 3 are mounted while changing their relative positions, and thus an area to be evaporated and worn of the target 1 is changed to prolong the service time of a solid evaporation raw material. COPYRIGHT: (C)2008,JPO&INPIT
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