发明名称 |
Extreme ultraviolet light source |
摘要 |
The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
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申请公布号 |
US2008023657(A1) |
申请公布日期 |
2008.01.31 |
申请号 |
US20070880319 |
申请日期 |
2007.07.20 |
申请人 |
CYMER, INC. |
发明人 |
MELNYCHUK STEPHEN T.;PARTLO WILLIAM N.;FOMENKOV IGOR V.;OLIVER I. R.;NESS RICHARD M.;BOWERING NORBERT R.;KHODYKIN OLEH;RETTIG CURTIS L.;BLUMENSTOCK GERRY M.;DYER TIMOTHY S.;SIMMONS RODNEY D.;HOFFMAN JERZY R.;JOHNSON R. M. |
分类号 |
G21K5/00;H01L31/18;G01J1/00;G03F7/20;G21K5/02;H01L21/027;H01S3/00;H05G2/00;H05H1/06;H05H1/24 |
主分类号 |
G21K5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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