| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an evaluation method for a pattern capable of accurately evaluating a pattern. <P>SOLUTION: The method includes: a step S14 of irradiating a photomask where a pattern as a measurement object is formed with energy waves; a step S15 of detecting response waves from the photomask; a step S16 of obtaining an edge profile of the measurement object pattern from the response waves; a step S17 of obtaining a dimension of the measurement object pattern in a predetermined region from the edge profile; a step S18 of subjecting the edge profile in the predetermined region to frequency analysis to obtain intensity distribution of frequency components; and a step S19 of extracting a portion at frequencies lower than a predetermined frequency from the intensity distribution. <P>COPYRIGHT: (C)2008,JPO&INPIT |
