发明名称 |
IMMERSION TOPCOAT MATERIALS WITH IMPROVED PERFORMANCE |
摘要 |
A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
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申请公布号 |
US2008026330(A1) |
申请公布日期 |
2008.01.31 |
申请号 |
US20070868320 |
申请日期 |
2007.10.05 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ALLEN ROBERT D.;BROCK PHILLIP J.;GIL DARIO;HINSBERG WILLIAM D.;LARSON CARL E.;SUNDBERG LINDA K.;WALLRAFF GREGORY M. |
分类号 |
G03C5/00;C08F20/06 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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