| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photocurable resin composition giving cured coating film enabling a substrate to be imparted with scratch resistance, cracking resistance, antistaining effect against pollutants, permanent marker-wiping-off capability and antistaticity, and to provide an article having the cured coating film. <P>SOLUTION: The photocurable resin composition comprises (1) a photoreactive group-containing siloxane compound which is obtained by the following process: (a) a photocurable group-containing hydrolyzable silane of formula(i):CH<SB>2</SB>=C(CH<SB>3</SB>)COOC<SB>3</SB>H<SB>6</SB>Si(CH<SB>3</SB>)<SB>3-a</SB>(OR<SP>1</SP>)<SB>a</SB>or (ii):CH<SB>2</SB>=CHCOOC<SB>3</SB>H<SB>6</SB>Si(CH<SB>3</SB>)<SB>3-6</SB>(OR<SP>2</SP>)<SB>b</SB>, wherein when there is one kind thereof, a trifunctional silane, when there are two or more kinds thereof,≥70 mol% thereof being a trifunctional silane, or a hydrolyzate or partial condensate thereof, (b) a dimethylsiloxane containing hydrolyzable groups on both ends of formula(iii) and (c) a hydrolyzable fluorosilane of formula(iv):R<SP>4</SP>R<SP>5</SP><SB>3-c</SB>Si(OR<SP>6</SP>)<SB>c</SB>, are subjected to hydrolytic condensation in the presence of a basic catalyst with such an amount of water as to be more than that enough to subject the all of the hydrolyzable groups to hydrolytic condensation, (3) a compound of the formula:(CF<SB>3</SB>(CF<SB>2</SB>)<SB>m</SB>SO<SB>2</SB>)<SB>2</SB>NLi(m=0-7) and (4) a radical-based photopolymerization initiator. The article bearing the cured coating film from the resin composition is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
