| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the risk of reticle deformation by improving reticle handling. <P>SOLUTION: A reticle gripper to hold a reticle of a lithographic apparatus is presented. The reticle gripper includes three gripper structures to make contact with the surface of the reticle. Each of the three gripper structures determines the position of one of points on the surface of the reticle with respect to the reticle gripper. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2008021995(A) |
申请公布日期 |
2008.01.31 |
| 申请号 |
JP20070176951 |
申请日期 |
2007.07.05 |
| 申请人 |
ASML HOLDING NV |
发明人 |
FEROCE JONATHAN H;VAN DOREN MATTHEW J |
| 分类号 |
H01L21/027;G03F7/20;H01L21/677 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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