METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

A method for manufacturing a semiconductor device is provided to form a desired shaped layer on a desired position without using a photolithography process by transferring an optical absorption layer on a substrate. A method for manufacturing a semiconductor device comprises the steps of: forming a light absorption layer on one surface of a first substrate; providing a second substrate on the light absorption layer; providing a mask on another surface of the first substrate; and transferring a part of the light absorption layer on the second substrate by irradiating a laser beam on the light absorption layer passing through the mask.