| 摘要 |
An EUV(Extreme Ultra Violet) light source apparatus and an extreme ultra violet light generating method are provided to suppress the movement of debris into an EUV condenser while supplying plasma raw material to a discharge region. An EUV light source apparatus includes a case, a raw material supplying device(2), an energy beam irradiating device, a pair of discharge electrodes(1a,1b), a pulse power supplying device, a light collecting optical device, and an EUV light extracting unit. The raw material supplying device emits the EUV light inside the case and supplies liquid or solid raw material(2a). The energy beam irradiating device irradiates the energy beam to the raw material and vaporizes the raw material. The pair of discharge electrodes generate plasma at a high temperature and are spaced apart from each other at a predetermined distance. The pulse power supplying device supplies a pulse power to the discharge electrodes. The light collecting device collects the EUV light emitted from the plasma at a high temperature. The EUV light extracting unit extracts the collected EUV light.
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