PHOTORESIST DEVELOPER AND METHOD FOR FORMING A PHOTORESIST PATTERN USING THE SAME

摘要

A photoresist developer is provided to reduce a process time, improve a production efficiency, and thus enhance productivity of a semiconductor production process. A photoresist developer includes 0.50-2.38wt% of a hydrogen-bonding compound, 0.01-5.00wt% of a surfactant, and the balance of an aqueous alkaline solution. The hydrogen-bonding compound comprises 4-(3-aminopropyl)morpholine represented by the following formula. A method for forming a photoresist pattern includes the steps of: selectively exposing a photoresist layer formed on a semiconductor substrate to a light; and developing the exposed photoresist layer using the photoresist developer.