| 摘要 |
A plasma processing chamber having a multi remote plasma generator is provided to stably supply large amount of uniform plasma into a chamber housing by mounting one or more remote plasma generators in an accommodating space formed on an upper portion of the chamber. A chamber housing has a substrate support(230) on which a target substrate is placed. A chamber upper portion(200) configures an upper portion of the chamber housing. One or more accommodating spaces(210) are formed on an outer upper portion of the chamber upper portion to mount a remote plasma generator. A gas entrance(312) is formed in the accommodating space. One or more remote plasma generator(300) is mounted on the accommodating space. The remote plasma generator supplies remotely plasma into an inside of the chamber housing through the gas entrance. The remote plasma generator includes two ring-shaped discharge tubes(310), a ring-shaped core(320) having a first winding, and a cooling channel. The ring-shaped tubes have gas entrances and gas exits(314). The first winding is electrically connected to a power supplying source.
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