| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a seamless mask structure that facilitates designing a continuous pattern including a mixture of small and large images such as dots and solid patterns and that achieves high durability in a cylindrical seamless mask. <P>SOLUTION: The cylindrical mask structure comprises a cylindrical substrate and a mask material, wherein the substrate is substantially transparent to actinic rays and the mask material is laid as seamless on the substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
