| 摘要 |
PROBLEM TO BE SOLVED: To provide a TFT array substrate in which a process is simplified by directly exposing and patterning a protective film without using a photoresist, and the unit price of the process is reduced, and also to provide its manufacturing method. SOLUTION: A manufacturing method of a TFT array substrate comprises stages of: forming a gate electrode and a gate wiring on a substrate; forming a semiconductor layer that is insulated from the gate electrode and overlaps with a part of the gate electrode; forming source/drain electrodes respectively on both sides of the semiconductor layer and forming a data wiring orthogonal to the gate wiring at the same time; forming a protective film from a silicon alkoxide containing a photosensitive group X and a sol compound of a metal alkoxide containing a photosensitive group Y on the entire surface including the source/drain electrodes; exposing and developing the protective film and forming a contact ball exposing the drain electrode; and forming a pixel electrode making contact with the drain electrode through the contact ball. COPYRIGHT: (C)2008,JPO&INPIT |
