| 摘要 |
A lithographic apparatus and a device manufacturing method are provided to remove a zeroth non-diffracted order of a patterned beam of a radiation beam by having a filter. A method for transferring an image of a pattern onto a substrate with a lithographic apparatus includes the steps of: selecting a plurality of parameters including a pupil filter parameter; calculating an image of the pattern for the selected parameters; calculating a metric to represent a change of a property of the calculated image over a process range; and based on a result of the metric, (a) adjusting the pupil filter diameter, (b) calculating the image of the pattern, and (c) calculating the metric until a substantially minimum or a maximum value of the change of property is obtained. |
