发明名称 APPARATUS BASE ISOLATION DEVICE
摘要 PROBLEM TO BE SOLVED: To surely prevent relative displacement or relative behavior of respective manufacturing apparatuses constituting a manufacturing device system, by reducing the floor area of an indoor space occupied by a composite manufacturing device system such as an exposure device. SOLUTION: A manufacturing facility has the indoor space 1 and a lower layer space 6. A rigid skeleton of an apparatus base isolation device 50 is composed of rigid floor sets 51 and 52 of an upper layer and a lower layer and a rigid column 53 integrally connecting the upper-lower floor sets. The rigid floor set 52 of the upper layer is supported by a floor structure 2 of the indoor space 1 via base isolation supports 70 and 80, and the column horizontally displaceably penetrates through the floor structure 2, and suspends the rigid floor set 51 of the lower layer by the lower layer space 6. First manufacturing apparatuses 10 and 10' and second manufacturing apparatuses 11 and 11' constituting the manufacturing device system, are respectively fixed on the upper and lower floor sets. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008008028(A) 申请公布日期 2008.01.17
申请号 JP20060179380 申请日期 2006.06.29
申请人 TAKENAKA KOMUTEN CO LTD 发明人 YAMAMOTO MASAFUMI;OTSUKA MASAHIRO;KAKIZAKI JIRO;RO TOSHITAMI;YOSHIOKA HIROKAZU;WATANABE MORIHIDE;TANIGUCHI KAZUTO
分类号 E04F15/18;E04H5/02;F16F15/02 主分类号 E04F15/18
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