发明名称 |
ELECTRODE FOR VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING APPARATUS HAVING SAME |
摘要 |
An electrode for vacuum processing apparatus and a vacuum processing apparatus having the same are provided to reduce a temperature difference by forming respectively an inlet and an outlet at an edge part and a center part thereof. An electrode includes a gate for receiving and transmitting a substrate. The electrode is installed in a chamber having a treatment space for performing a treatment process in order to form plasma within the treatment space. The electrode includes a refrigerant path, an inlet(320) for supplying a refrigerant into the refrigerant path, and an outlet(330) for discharging the refrigerant from the refrigerant path. The inlet is formed at an edge of the electrode. The outlet is formed at a center part of the electrode.
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申请公布号 |
KR20080006848(A) |
申请公布日期 |
2008.01.17 |
申请号 |
KR20060066110 |
申请日期 |
2006.07.14 |
申请人 |
INTEGRATED PROCESS SYSTEMS LTD. |
发明人 |
EOM, YONG TAEK;LEE, JU HEE;HUH, HYUNG KANG |
分类号 |
H01L21/3065;H01L21/205 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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