发明名称 |
Processing chamber having labyrinth seal |
摘要 |
An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A seal arrangement is provided for the processing chamber.
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申请公布号 |
US2008011421(A1) |
申请公布日期 |
2008.01.17 |
申请号 |
US20070825669 |
申请日期 |
2007.07.06 |
申请人 |
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发明人 |
BAILEY JOEL B.;HURET JEAN-MICHEL C.;FORDERHASE PAUL F.;SADAM SATISH;STRATTON SCOTT A.;ROBBINS MICHAEL D. |
分类号 |
C23F1/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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