发明名称 METHOD AND SYSTEM FOR MASK FABRICATION PROCESS CONTROL
摘要 A mask fabrication system. The mask fabrication system contains a processing tool, a metrology tool, and a controller. The processing tool processes a mask. The metrology tool inspects the mask to obtain an inspection result. The controller generates a manufacturing model of the processing tool and calibrates the manufacturing model according to a device data, a material data, and the inspection result of the mask.
申请公布号 US2008015818(A1) 申请公布日期 2008.01.17
申请号 US20070779426 申请日期 2007.07.18
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 HWANG YUH-FONG;CHANG CHEN-YU;KUO CHIECH-YI;CHEN WEN-YAO
分类号 G06F11/30;G06F17/50 主分类号 G06F11/30
代理机构 代理人
主权项
地址