METHOD OF DRYING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME

摘要

A method for drying a semiconductor substrate and an apparatus for performing the same are provided to prevent the leaning effect of a capacitor caused by surface tension of water in a Marangoni dryer. A dipping process is performed to dip a semiconductor substrate into a receptacle with alcohol of a liquid state(S100). A moisture removal process is performed to remove moisture from the semiconductor substrate by removing relatively the alcohol with respect to the substrate dipped into the alcohol of the receptacle(S110). An alcohol removal process is performed to remove the remaining alcohol by dipping the substrate into an organic solvent including fluorine(S120). The alcohol includes isopropyl alcohol.