| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for coating and exposure of a resist liquid by which sufficient resolution is obtained without using an expensive light source device generating collimated beams, and a coating step and an exposure step of a resist liquid can be carried out in the same apparatus. <P>SOLUTION: The apparatus for coating and exposure of a resist liquid is equipped with at least a coating means to coat a photomask with a resist liquid containing a spacer, a pressure bonding to pressure bond a glass substrate to a specified surface of the resist coating, and an irradiating means to irradiate the specified resist liquid surface with light through the photomask from the photomask face side. A resist liquid containing a spacer is applied on a photomask by the above apparatus, then a glass substrate is pressed to the resist liquid surface to squeeze out an excess resist liquid to control the film thickness of the resist liquid held between the glass substrate and the photomask to a given thickness specified by the size of the spacer, and then the resist liquid is exposed by irradiating with light through the photomask side. <P>COPYRIGHT: (C)2008,JPO&INPIT |
