| 发明名称 |
PHOTOMASK BLANK |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask blank that can further decrease the width and height of a fringe portion produced in a resist coating step. <P>SOLUTION: The width W and height H of a fringe portion 9 of a resist 13 at a rim portion 3 of a light transmitting substrate 1 can be decreased by forming an inclined portion 11 between the main surface 2 and a chamfered portion 4 of the light transmitting substrate 1 in such a manner that the depression angle Y of the inclined portion 11 is smaller than the depression angle X of the chamfered portion 4 and in a range of 10°to 20°. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
| 申请公布号 |
JP2008003208(A) |
申请公布日期 |
2008.01.10 |
| 申请号 |
JP20060171200 |
申请日期 |
2006.06.21 |
| 申请人 |
ULVAC SEIMAKU KK;FINE SURFACE GIJUTSU:KK |
发明人 |
MURAI TADAYUKI;KIDA YOSHINORI;UCHIDA AKIRA;HORIGUCHI HIDE |
| 分类号 |
C03C17/38;C03C19/00;G03F1/50 |
主分类号 |
C03C17/38 |
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