发明名称 Optical head for chemical mechanical polishing
摘要 A polishing system includes a platen, a carrier head to hold a surface of a substrate against a polishing pad on the platen, a monitoring module including a light source and a detector, an optical fiber having a proximate end coupled to the monitoring module and a distal end, and an optical head removably mounted in the platen. The optical head holds the distal end of the optical fiber to direct light through a window in the polishing pad to the surface of the substrate and receive reflected light from the surface of the substrate, and the optical head is configured to adjust a distance from the distal end of the fiber to the window.
申请公布号 US2008009227(A1) 申请公布日期 2008.01.10
申请号 US20070894785 申请日期 2007.08.20
申请人 APPLIED MATERIALS, INC. 发明人 BENVEGNU DOMINIC J.;DAVID JEFFREY D.;SWEDEK BOGDAN
分类号 B24B49/12 主分类号 B24B49/12
代理机构 代理人
主权项
地址