| 摘要 |
PROBLEM TO BE SOLVED: To provide a treatment method of persulfate and hydrogen peroxide high in utilization efficiency of facilities and enabling swift wastewater treatment. SOLUTION: The treatment method of purifying wastewater discharged from a semiconductor manufacturing plant comprises simultaneously treating persulfate contained in wastewater discharged from a CMP process and hydrogen peroxide contained in wastewater discharged form a semiconductor cleaning process, removing a suspended matter contained in the wastewater from the wastewater discharged from the CMP process to also mix the CMP process wastewater removed with the suspended matter with the wastewater discharged from the semiconductor cleaning process, and further bringing the mixed wastewater into contact with a catalyst, thereby simultaneously carrying out reduction decomposition of persulfate and hydrogen peroxide present in the mixed wastewater. COPYRIGHT: (C)2008,JPO&INPIT
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