发明名称 Donor substrate for laser induced thermal imaging and method of fabricating organic light emitting display using the same
摘要 <p>Provided are a donor substrate for laser induced thermal imaging (LITI) and method of fabricating an organic light emitting display (OLED) using the same donor substrate. A conductive frame is disposed on an outer portion of the donor substrate and connected to an anti-static layer. The conductive frame of the donor substrate is connected to a grounded stage. In this structure, while an organic layer is formed using an LITI process, the generation of static electricity may be controlled.</p>
申请公布号 EP1629990(B1) 申请公布日期 2008.01.09
申请号 EP20050107902 申请日期 2005.08.30
申请人 SAMSUNG SDI CO., LTD. 发明人 KIM, MU-HYUNG;SONG, MYUNG-WON;CHIN, BYUNG-DOO;LEE, SEONG-TAEK
分类号 B41M5/26;B41M5/36;B41M5/382 主分类号 B41M5/26
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