ROLL BRUSH UNIT AND METHOD FOR CLEANING A ROLL BRUSH OF THE SAME

摘要

A roll brush unit and a method for cleaning a surface of a roll brush of the same are provided to prevent defects of a wafer due to the roll brush by performing an automatic roll brush cleaning process. A contact cleaning member(52) is installed at one side of a roll brush which is located at a standby position when a wafer cleaning process is finished. The contact cleaning member comes in contact with a constant surface of the roll brush having a cylindrical shape in order to rub and clean a surface of the roll brush according to a repeated movement thereof. A perpendicular transferring unit attaches the contact cleaning member to the surface of the roll brush or separates the contact cleaning member from the surface of the roll brush. A longitudinal transferring unit moves the contact cleaning member along a longitudinal direction of the roll brush.