| 发明名称 |
METHOD FOR MANUFACTURING MASK, METHOD FOR MANUFACTURING WIRING PATTERN, AND METHOD FOR MANUFACTURING PLASMA DISPLAY |
| 摘要 |
A method for manufacturing a mask includes performing a lyophobic treatment on at least one surface of a translucent substrate; disposing a light-shielding material on the surface subjected to the lyophobic treatment of the translucent substrate in a desired shape by using a droplet discharge method; and firing the light-shielding material so as to form a light-shielding pattern on the translucent substrate.
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| 申请公布号 |
US2008003509(A1) |
申请公布日期 |
2008.01.03 |
| 申请号 |
US20070749365 |
申请日期 |
2007.05.16 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU;KIGUCHI HIROSHI |
| 分类号 |
G03C5/00;G03F7/00;H01J9/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34 |
主分类号 |
G03C5/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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