| 摘要 |
<p>A resonant scanning mirror is provided to embody rotation without distortion by removing vibration while using a synchronous scanning mirror. An illumination system(IL) conditions a radiation beam received from a radiation source(SO) operating at a first frequency. A patterning device(PD) patterns the radiation beam. A wafer table(WT) supports a wafer(W) and scans the wafer at a scanning speed. A scanning device includes a reflection device and a plurality of flexures. A projection system(PS) includes the illumination system, the patterning device, the wafer table and the scanning device. The plurality of flexures is constructed to resonate with respect to the rotation axis of the reflection device. The scanning device is constructed to scan the patterned beam to a target region of the wafer. The resonant frequency of the scanning device is substantially the same as the first frequency, synchronized with the scanning speed. The scanning device can include a driving system that is constructed to resonate as a second frequency with respect to the rotation axis of the reflection device.</p> |
