| 摘要 |
<p>A method for adjusting the temperature of a semiconductor wafer is provided to improve temperature nonuniformity caused by evaporation of liquid by having an atmosphere of an immersion lithography process in which fluid for immersion lithography maintains a saturated vapor state. An immersion lithography process is used to fabricate a semiconductor device. The atmosphere of the immersion lithography process maintains a saturated vapor state of the fluid(30) for immersion lithography. The fluid for immersion lithography can be ultra pure water. The saturated vapor(200) of the fluid for immersion lithography can have a temperature of 22-23 °C.</p> |
