发明名称 VACUUM VAPOR-DEPOSITION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a vacuum vapor-deposition apparatus for forming a thin film of an organic compound while preventing a plurality of different types of evaporation sources from contaminating each other. <P>SOLUTION: The vacuum vapor-deposition apparatus 100 comprises: deposition-preventing vessels 140, 150 which accommodate each a first evaporation source 120 having a crucible 121 filled with an organic evaporation material 124, and a second evaporation source 130 having a crucible 131 filled with an organic evaporation material 134, both on the bottom face of a vacuum chamber 110; wherein by the rotation of the motor 162, the shutter 160 sequentially opens both the first evaporation source 120 and the second evaporation source 130 one by one, and thus the organic thin film made from the organic evaporation materials 124 and 134 is formed on the surface of a large number of substrates 10 mounted on the substrate holder 170. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007332433(A) 申请公布日期 2007.12.27
申请号 JP20060167037 申请日期 2006.06.16
申请人 SEIKO EPSON CORP 发明人 KANAI TOSHIHITO;SEKI HIROYUKI
分类号 C23C14/24;C23C14/12;G02B1/10 主分类号 C23C14/24
代理机构 代理人
主权项
地址
您可能感兴趣的专利