| 摘要 |
PROBLEM TO BE SOLVED: To provide a sealing membrane forming device and a sealing membrane forming method which can achieve improvement in maintainability by inhibiting contamination in a device due to monomer vapor as much as possible, and which are superior in practicality. SOLUTION: This is the sealing membrane forming device for forming the sealing membrane consisting of a polymer membrane and a barrier membrane on a substrate carried into a device and carrying it out from the device is configured to couple a load lock chamber A having a load lock mechanism, a barrier membrane forming chamber B having a barrier membrane forming mechanism, a monomer polymerization chamber C having a monomer polymerizing mechanism, and a monomer vapor deposition chamber D having a monomer vapor deposition mechanism in this order in series in front and rear via an opening/closing part E, respectively. The substrate which is carried in from the load lock chamber A, to which treatment is applied in a prescribed sequence at respective chambers, and on which the sealing membrane is formed can be taken out from the load lock chamber A. COPYRIGHT: (C)2008,JPO&INPIT
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