发明名称 |
SHOWER PLATE, PLASMA PROCESSING DEVICE USING THE SAME, PLASMA PROCESSING METHOD AND MANUFACTURING METHOD OF ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a shower plate which is capable of dispensing with a cover plate. SOLUTION: The shower plate 105 is arranged in the processing chamber 102 of a plasma processing device and emits a plasma exciting gas so as to generate plasma in the processing chamber 102. The plate 105 is made of an integral structure, and a lateral hole 111 through which plasm exciting gas is introduced from the gas inlet port 110 of the plasma processing device and a vertical hole 112 communicating with the lateral hole 111 are provided to the shower plate 105. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2007335510(A) |
申请公布日期 |
2007.12.27 |
申请号 |
JP20060163526 |
申请日期 |
2006.06.13 |
申请人 |
HOKURIKU SEIKEI KOGYO KK;TOKYO ELECTRON LTD;TOHOKU UNIV |
发明人 |
OKESAKU MASAHIRO;GOTO TETSUYA;OMI TADAHIRO;ISHIBASHI KIYOTAKA |
分类号 |
H01L21/3065;C23C16/455;H01L21/205 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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