| 摘要 |
A memory device including a substrate, a plurality of conductive layers, a composite dielectric layer and a plurality of gates are provided. Wherein, the conductive layers are disposed on the substrate. The composite dielectric layer is disposed on the substrate and covers the conductive layers. The composite dielectric layer includes a charge trapping layer. The gates are disposed on the composite dielectric layer and across the conductive layers. Wherein, the conductive layers can be used as local bit lines to reduce the resistance values and improve the performance of the memory device.
|
