发明名称 |
GAS COUPLER FOR SUBSTRATE PROCESSING CHAMBER |
摘要 |
A gas coupler is capable of conducting gas between a gas component, gas souce and substrate processing chamber. The gas coupler comprises a metal block comprising a gas component seating surface having a plurality of gas component coupling ports. The block also has a plurality of sidewalls at right angles to the gas component seating surface, each sidewall comprising a counterbored gas orifice. A plurality of right-angled internal passageways are each connected to a gas component coupling port. Each internal passageway terminates at counterbored gas orifice on a different sidewall surface so that each gas component coupling port is fluidly connected to a different sidewall.
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申请公布号 |
WO2007076076(A3) |
申请公布日期 |
2007.12.27 |
申请号 |
WO2006US49151 |
申请日期 |
2006.12.21 |
申请人 |
APPLIED MATERIALS;HUSTON, JOEL;TOBIN, JEFFERY;MARCADAL, CHRISTOPHE |
发明人 |
HUSTON, JOEL;TOBIN, JEFFERY;MARCADAL, CHRISTOPHE |
分类号 |
F16L27/00;C23C16/00;H01L21/306 |
主分类号 |
F16L27/00 |
代理机构 |
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主权项 |
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地址 |
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