| 摘要 |
A semiconductor device and a manufacturing method thereof are provided to form plural different functional parts at every unit chip area by at least one parameter value to prevent discarding of semiconductor devices having a functional part which does not correspond to a reference value. A semiconductor device including at least one parameter value having plural different functional parts is composed of a semiconductor layer formed on a substrate and plural mesa parts formed on the semiconductor layer at every unit chip area. Diameters(R1~R4) of the mesa parts are set correspondently to a predetermined reference(a10±Deltax10) on the assumption that a maximum error(±Deltay) exists for oxidation depth. A non-oxidized region is formed by selectively oxidizing each mesa part by executing oxidation at high temperature in the steam atmosphere. And then, oxidation constriction diameters(a1~a4) of each non-oxidized region are measured by an optical microscope and the substrate is split for each unit chip area without destroying the mesa part having the non-oxidized region corresponding to the predetermined reference. |
