APPARATUS FOR PROCESSING SUBSTRATE

摘要

An apparatus for processing a substrate is provided to reduce operation time by reusing oxygens within gas exhausted to the outside, thereby reducing process costs of a display substrate. A substrate process part(400) combines a stripper to a photoresist formed on a substrate, to separate the photoresist from the substrate. An ozone generation part(100) generates ozone gas by using first oxygen gas within the air. A reaction part(200) resolves the photoresist by reacting the photoresist exhausted from the substrate process part to the ozone gas. An ozone elimination part(600) resolves the ozone gas exhausted from the reaction part. An oxygen reusing part supplies second oxygen gas exhausted from the ozone elimination part to the ozone generation part. The ozone generation part generates the ozone gas by using the second oxygen gas.