| 摘要 |
An apparatus for detecting rotation of a wafer is provided to inform a rotation state of the wafer to a user by automatically checking the wafer rotation, thereby preventing defect propagation to the post processes. A contact roller(10) is rotated by contacting with a frame surface(2) of a wafer(1), when the wafer is rotated. A detecting unit detects a rotation of a rotation axis(11) of the contact roller. A transport unit transports selectively the contact roller toward the frame surface of the wafer. The detecting unit comprises a rotation plate installed at the rotation axis, a light emitting sensor irradiating the light to a rotation region of the rotation plate, and a controller checking a rotation speed by sensing an on/off signal of a light receiving sensor.
|
