| 摘要 |
A nozzle washing device and a substrate processing device including the same are provided to minimize the time required for performing nozzle washing by removing a processing solution remaining on a tip of a slit nozzle and solve dryness of the slit nozzle. A body includes a first nozzle forming region and a second nozzle forming region defined along a longitudinal direction, and the first nozzle forming region is disposed in an advancing direction, and the second nozzle forming region is disposed at the opposite side to the advancing direction. A first nozzle(761) is formed in the first nozzle forming region, and sprays a washing solution to a tip of the slit nozzle. A second nozzle(762) is formed in the second nozzle forming region, and sprays a dry gas to the tip of the slit nozzle. |
