| 摘要 |
<p>A proximity aligner (PE) comprises a substrate holding part (21) for holding a substrate (W) as a work to be exposed, a mask holding part (12) for holding a mask (M) having an exposure pattern, and an illumination optical system (40) for illuminating the substrate (W) with a light for pattern exposure with the mask (M) interposed therebetween. With the mask (M) and the substrate (W) disposed in proximity to each other with a predetermined gap (g) formed therebetween, the mask pattern of the mask (M) is transferred by exposure onto the substrate (W) by the illumination optical system (40). The illumination optical system (40) comprises a collimation mirror (47) and an illumination angle varying mechanism (71) for varying the illumination angle (?d) of the light for pattern exposure reflected by the collimation mirror (47) by deforming or moving the collimation mirror (47).</p> |
