| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film deposition method capable of suppressing the deposition of a film whose film thickness and film quality are ununiform, to provide a thin film deposition system, and to provide an electrophotographic photoreceptor, a process cartridge and an image forming apparatus using the thin film deposition method. SOLUTION: A film depositable gas feed port 24A in a film depositable gas feed tube 24 is arranged so as to be located in a reaction inactive region 48, and a film depositable gas is fed to the reaction inactive region 48. In this way, the film depositable gas fed to the reaction inactive region 48 moves from the reaction inactive region 48 to a reaction active region 44 continued to the reaction inactive region 48 in the reaction vessel 12. The film depositable gas moves from the reaction inactive region 48 toward the reaction active region 44 in this way, the uniformization in the density of the film depositable gas is promoted in the reaction inactive region 48, and a thin film whose film thickness and film quality are homogeneous grows in the reaction active region 44. COPYRIGHT: (C)2008,JPO&INPIT
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