| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mechanism which can certainly detect a crystal orientation indication mark of a semiconductor wafer, even in a case that the semiconductor wafer has a small quantity of concave from the perimeter circle to the crystal orientation indication mark. <P>SOLUTION: The wafer 1 has a circular perimeter surplus region 5 around device area 4 of whether two or more devices 3 are formed in the surface, or scheduled to be formed. A flat face which intersects perpendicularly with the plane direction of the wafer 1 is formed in the region of a chamfer as a mark 8 which indicates the crystal direction of the wafer 1 in the region of the chamfer of the perimeter edge of the perimeter surplus region 5. Light is made incident to the side surface of the wafer 1 from an optical sensor 43 having an optic axis L parallel to the plane direction of the wafer 1, and the mark 8 is detected in such a way that the optical sensor 43 detects the light reflected by the mark 8. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
