发明名称 SUBSTRATE FOR DIFFRACTION GRATING AND METHOD OF MANUFACTURING SUBSTRATE FOR DIFFRACTION GRATING
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate for diffraction grating on which a diffraction grating pattern is formed with high accuracy and to provide a method of manufacturing the substrate for diffraction grating. <P>SOLUTION: The substrate 10 for diffraction grating is used in the method of manufacturing a diffraction grating substrate 1 including: a coating process in which the upper face 10b of the substrate 10 for diffraction grating is coated by a photosensitive material layer 15; an exposure process in which the photosensitive material layer 15 is partially exposed to laser light 51 radiated from top; and a removing process in which the part of the photosensitive material layer 15 or the other part thereof is removed, wherein the laser light 51 incident from the upper face 10b of the substrate 10 for diffraction grating is repeatedly reflected at least twice on the lower face 10a of the substrate 10 for diffraction grating. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007328017(A) 申请公布日期 2007.12.20
申请号 JP20060157219 申请日期 2006.06.06
申请人 SHIMADZU CORP 发明人 KAWADA MASARU
分类号 G02B5/18;G03F7/20;G03F7/40;H01L21/027 主分类号 G02B5/18
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