发明名称 OPTICAL SYSTEM FOR IMPROVING EFFICIENCY IN IRRADIATION ON PATTERNING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a lighting formation system and its method for illuminating effectively a target area of an object. <P>SOLUTION: The target area may be a transparent area of an aperture diaphragm and/or an operation area of a patterning device. A beam group formed by a filed formation element is oriented to an incident end of a rod group by using a relay, which includes a first lens array and a second lens array. By a rod, the lighting formation is made so that the beam may be substantially projected only inside a border of a target area, for example the transparent area and/or the operation area. The number of rods, its constitution, and the shape of cross section are formed according to the number of the target areas; for example the number of transparent areas and/or operation areas, its constitution, and the shape of cross section. In this way, all the illumination light is projected to the inner side of the target area and efficiency in illumination can be improved. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007329455(A) 申请公布日期 2007.12.20
申请号 JP20070105001 申请日期 2007.04.12
申请人 ASML HOLDING NV 发明人 STANISLAV SMIRNOV Y
分类号 H01L21/027;G02B3/00;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址