发明名称 |
Lithography Processes Using Phase Change Compositions |
摘要 |
A lithography method includes the steps of: A) filling a mold having a patterned surface with a phase change composition at a temperature above the phase change temperature of the phase change composition; B) hardening the phase change composition to form a patterned feature; C) separating the mold and the patterned feature; optionally D) etching the patterned feature; optionally E) cleaning the mold; and optionally F) repeating steps A) to D) reusing the mold. The PCC may include an organofunctional silicone wax.
|
申请公布号 |
US2007290387(A1) |
申请公布日期 |
2007.12.20 |
申请号 |
US20050661028 |
申请日期 |
2005.09.23 |
申请人 |
CHEN WEI;HARKNESS BRIAN R;SUDBURY-HOLTSCHLAG JOAN;PETROFF LENIN J |
发明人 |
CHEN WEI;HARKNESS BRIAN R.;SUDBURY-HOLTSCHLAG JOAN;PETROFF LENIN J. |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|