发明名称 Lithography Processes Using Phase Change Compositions
摘要 A lithography method includes the steps of: A) filling a mold having a patterned surface with a phase change composition at a temperature above the phase change temperature of the phase change composition; B) hardening the phase change composition to form a patterned feature; C) separating the mold and the patterned feature; optionally D) etching the patterned feature; optionally E) cleaning the mold; and optionally F) repeating steps A) to D) reusing the mold. The PCC may include an organofunctional silicone wax.
申请公布号 US2007290387(A1) 申请公布日期 2007.12.20
申请号 US20050661028 申请日期 2005.09.23
申请人 CHEN WEI;HARKNESS BRIAN R;SUDBURY-HOLTSCHLAG JOAN;PETROFF LENIN J 发明人 CHEN WEI;HARKNESS BRIAN R.;SUDBURY-HOLTSCHLAG JOAN;PETROFF LENIN J.
分类号 G03F7/00 主分类号 G03F7/00
代理机构 代理人
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