发明名称 DISCHARGE TYPE GAS TREATMENT APPARATUS AND GAS TREATMENT METHOD THEREFOR
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a discharge type gas treatment apparatus in which the gate width of a switching element can be controlled according to variation of a state in a gas treatment part. <P>SOLUTION: The discharge type gas treatment apparatus 31 is equipped with a temperature measuring part 32 and a control part 33. The temperature measuring part 32 is disposed inside a discharge part 13 and always measures the temperature inside the discharge part 13, creates temperature measuring signals showing the measured temperature, and supplies the created signals to the control part 33 in a discharge power source 14 via a signal line 34. The control part 33 controls the timing (gate width) of a switch 25 outputting a high voltage pulse in the discharge power source 14 based on the temperature measuring signals supplied via the signal line 34 from the temperature measuring part 32, namely controls the switch 25 to open when a resonance period of a charge circuit has ended. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2007326051(A) 申请公布日期 2007.12.20
申请号 JP20060159877 申请日期 2006.06.08
申请人 TOSHIBA CORP;TOSHIBA PLANT SYSTEMS & SERVICES CORP 发明人 HAYASHI KAZUO;HATANO YUKIHIKO;YASUI SUKEYUKI;ARAKI KUNIYUKI;KAWAKAMI MASAYA
分类号 B01D53/38;B01D53/32;H01T19/00 主分类号 B01D53/38
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