| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold for imprint-processing which is good in releasability, prevents a mold release agent from intruding into the recessed groove portion of the mold, enables transfer of a normal pattern by press processing, and can be produced simply and safely. SOLUTION: The mold for imprint-processing 12 is composed by covering the mold with perfluoropolyether 11 having a functional group chemically reacted with the material 10 of the mold, and is used for the pattern formation of a semiconductor device or micro-optical element. COPYRIGHT: (C)2008,JPO&INPIT
|
