MEASUREMENT METHOD AND APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

A measurement method is provided to high precisely measure an optical characteristic of an optical system by removing a reference wavefront error from a wavefront aberration of a tested optical system. A wavefront aberration of a tested optical system is obtained from an interference pattern formed by the light from a first upper surface slit and the light from a second upper surface slit. A reference wavefront error is eliminated which is included in an object surface reference wavefront formed by a first object slit and in an upper surface reference wavefront formed by a first upper surface slit.