发明名称 Use of sacrificial layers in the manufacture of high performance systems on tailored substrates
摘要 The invention relates to methods for preparing a removable system on a mother substrate. The method deposits a high surface to volume sacrificial layer on a mother substrate and stabilizes the sacrificial layer by a) removing volatile chemical species in and on the sacrificial layer and/or b) modifying the surface of the layer. The method coats over the sacrificial layer with a capping medium. A system is the fabricated on the capping medium. The method provides through holes to access the sacrificial layer. The method may also apply a top layer onto the system to form a covered system. The invention also includes the step of removing the sacrificial layer to release the system from the mother substrate. Methods of the invention also include selectively removing a portion of the system and capping layers to form void regions defining an array of islands composed of device, structure, or system and capping layer regions, and optionally filling the island-defining void region with a sacrificial material. In such methods the sacrificial material and the high surface to volume sacrificial layer are removed to release the system from the mother substrate. Methods of the invention also include applying a layer to the capping material side of the released system to form a configuration wherein the system is substantially within a bending-stress reduced neutral plane. The systems fabricated according to the invention may be placed on a wide variety of suitable substrates, including flexible substrates.
申请公布号 US7309620(B2) 申请公布日期 2007.12.18
申请号 US20030340723 申请日期 2003.01.13
申请人 THE PENN STATE RESEARCH FOUNDATION 发明人 FONASH STEPHEN J.;LI HANDONG;LEE YOUNGCHUL;CUIFFI JOSEPH D.;HAYES DANIEL J.
分类号 H01L21/00;B81C99/00;G02B6/12;G02B6/132;G02B6/136;H01L21/20;H01L21/68;H01L21/762;H01L21/77;H01L21/84;H01L27/12 主分类号 H01L21/00
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