POLYIMIDE PRECURSOR COPOLYMER, VARNISH CONTAINING THE SAME, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POLYIMIDE COPOLYMER, SEMICONDUCTOR ELEMENT PROTECTIVE FILM CONTAINING THE SAME AND METHOD FOR PRODUCING FINE PATTERN OF POLYIMIDE COPOLYMER CONTAINING FILM

摘要

PROBLEM TO BE SOLVED: To provide a technology related to a polyimide precursor copolymer or a polyimide copolymer actualizing high transparency, high modulus of elasticity and excellent solvent solubility in good balance.

SOLUTION: The polyimide precursor copolymer is obtained by copolymerizing a first acid dianhydride having a specific structure with a second acid dianhydride having a specific structure different from that of the first acid dianhydride and one or more kinds of diamines each containing one or two aromatic rings.

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