Illumination system for use during manufacturing of e.g. integrated circuit, has optical units arranged between collector and illumination field, and optical axis deflected onto illumination-main level around preset degrees

摘要

The system (1) has reflecting optical units (10-15) arranged between a collector and an illumination field (2). An optical axis (7) strikes the optical units at an incident angle, which is either greater than 70 degrees or smaller than 20 degrees. A deflection angle extends between source-axial sections (19) of the axis, which runs between the collector and one of the units. A field-axial section (17) of the optical axis continues between the unit (15) and the field. The optical axis is projectedly deflected onto an illumination-main level (18) between the sections around 30 degrees. An independent claim is also included for a method for microlithographically manufacturing a micro-structured component.